UV and DUV Light Sources for Semiconductor Inspection

UV and DUV Lighting for Semiconductor Inspection and Advanced Imaging

Consistent lighting for reproducible inspection and review processes.

In inspection, review, and metrology systems for semiconductor manufacturing, wavelength, optical stability, coupling, and power supply directly influence detection quality. LEJ develops UV and deep-UV light sources, electronic ballasts, and integrable OEM subsystems for wafer inspection, photomask inspection, optical reviews, and specialized surface analyses.

Our focus is on sophisticated lighting and power supply solutions—not on lithography exposure sources. We support equipment manufacturers from the technical concept phase through functional prototypes and validation to mass production.

Discuss UV/DUV inspection applications

Please provide us with the wavelength, optical power, coupling, stability requirements, installation space, and target quantity. LEJ will evaluate the appropriate system approach.

Products Used in Semiconductor Manufacturing

LED PICO Frontansicht

LED PICO

Compact LED light source for a wide range of applications – from UV-A to VIS

Produkt Deep UV

DEEP UV SYSTEM

Hg-Xe illumination system for UV applications up to 100 W

Typical Applications

  • Wafer Inspection and Optical Review
  • Photomask Inspection and Defect Detection
  • UV-Based Surface and Coating Inspection
  • Fluorescence and Contrast Techniques in the Semiconductor Industry
  • specialized metrological and analytical systems
  • In-process imaging and quality control
  • Redesign and Replacement of Existing Lighting or Ballast Systems

Which requirements are crucial?

  • A specified UV or DUV wavelength, e.g., 365 nm or 248 nm
  • Stable optical performance and low ripple
  • Reproducible coupling via collimation, free-space beam, or optical fiber
  • Controlled thermal management and stable operating conditions
  • Reliable ignition and control of lamp-based systems
  • EMC-compliant integration and protective functions
  • Measurable and testable production parameters
  • Long-term availability, lifecycle and obsolescence management

Deep-UV systems at 248 nm

For short-wavelength inspection and review applications, 248-nm systems based on suitable HgXe mixed-gas lamps can be used. LEJ considers the light source, lamp housing, optics, ignition system, and electronic ballast as a complete system. The design is based on the required optical power, stability, working distance, coupling, and operating time.

The 248-nm solution is intended for lighting, inspection, and analysis applications. It is not intended to replace a KrF lithography exposure source.

UV-A and UV/VIS LED Solutions

LED-based light sources are attractive when compact design, long service life, fast switching, triggering, and good controllability are key considerations. LED PICO or custom LED modules can serve as a starting point for applications ranging from UV-A to VIS.

Electronic ballasts for Hg, Xe, and HgXe lamps

In gas-discharge lamps, the ballast affects ignition, operating point, luminous flux stability, and service life. LEJ develops and manufactures electronic ballasts that are tailored to the lamp type, power class, and the requirements of the optical system.

  • reliable ignition and controlled operation
  • A steady, low-flicker power supply
  • Protection, Monitoring, and Diagnostic Functions
  • Interfaces for Device Control and Service
  • Integration, documentation, and test plan in accordance with production standards

Optical Integration: Collimation, Free-Flight Beam, or Optical Fiber

Optimal coupling depends on geometry, homogeneity, beam profile, working distance, and installation space. LEJ provides support in the selection and integration of collimation optics, fiber-optic cables, adapters, and mechanical interfaces. The goal is to ensure a reproducible optical transfer to the customer’s system.

From the initial request to mass production

  1. Job Description:
    • Wavelength, power, stability, process, environment, installation space, and quantity.
  2. System Concept:
    • Light source, optics, coupling, electronics, cooling, and interfaces.
  3. Functional patterns:
    • Setup, measurement, endurance testing, and integration into the customer’s system.
  4. Verification:
    • Frequency range, power, stability, temperature, EMC, and protective functions.
  5. Industrialization:
    • Documentation, test equipment, procurement, mass production, and lifecycle support.

Technical Documentation and Supporting Documentation

For mass-production projects, simply proving that “it lights up” is not enough. Depending on the project, spectra, optical performance, stability, operating parameters, temperature behavior, test reports, and interface documentation may be required. LEJ develops project-specific documentation and testing concepts in consultation with the OEM.

Products and Entry Points

  • Deep-UV systems at 248 nm for inspection and review applications
  • LED PICO and Custom UV-A/VIS LED Modules
  • Electronic ballasts for Hg, Xe, and HgXe lamps
  • Optical fibers, adapters, and optical/mechanical integration
  • Custom OEM light sources and power supply electronics
  • Redesign and obsolescence solutions for existing systems

Why LEJ?

  • Light sources and power electronics from a single source
  • Experience with UV, DUV, and lamp-based systems
  • Development, Prototyping, and Mass Production in Jena
  • Suitable for demanding small- and medium-volume OEM production runs
  • Quality Management According to ISO 9001
  • Lifecycle, Redesign, and Obsolescence Support

Launch a Semiconductor OEM Project

Together, we will develop a UV/DUV lighting and power solution for your inspection or review platform.

FAQ

What is deep UV in the context of semiconductor inspection?

Deep UV refers to short-wavelength UV regions. For certain inspection and review tasks, 248 nm, for example, may be relevant because short wavelengths enable specific contrast or resolution effects.

Depending on the system—whether for wafer or mask inspection, optical review, surface analysis, or specialized metrological applications—the specific suitability depends on the optics, sensor technology, and measurement principle.

LEDs offer compactness, long service life, and fast switching. HgXe lamps may be a suitable choice for specific spectra or high optical power requirements. The selection is based on the system requirements.

It controls the ignition and regulated operation of the gas-discharge lamp and affects the stability, ripple, protective functions, and service life of the lighting system.

Optical fibers facilitate flexible spatial integration; direct collimation can offer advantages in terms of efficiency or beam guidance. The decision depends on the available space, geometry, and optical performance criteria.

Yes. LEJ can develop replacement solutions for discontinued ballasts, lamps, electronic components, or mechanical interfaces and bring them to a qualified production-ready stage.

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